Battery & Electronic Materials

SEMICOSIL® 2M2M is a high-purity dimethoxydimethylsilane with low levels of metal, chloride, and methanol content. It was developed specifically for the semiconductor industry, serving as a precursor for low-dielectric-constant interlayer dielectrics. This product is commonly used in chemical vapor deposition (CVD) and spin-on dielectric (SOD) applications.

SEMICOSIL® TEOS 999-LB is an ultra-high-purity tetraethoxysilane (TEOS) known for its exceptional chemical purity, very good trace metal purity, and very good purity in terms of boron and chloride. This product has been specifically developed for the semiconductor industry and finds typical applications as a precursor for low-dielectric constant interlayer dielectrics and other related uses.

SEMICOSIL® HMDSO-EL is a high-purity hexamethyldisiloxane (HMDSO) known for its exceptional purity, low metal content, and low chloride content. This product has been specifically developed to cater to the needs of the semiconductor industry. It finds applications in various processes such as chemical vapor deposition (CVD) and spin-on dielectrics (SOD).

ELASTOSIL® LR 6200 A/B is a liquid silicone rubber (LSR) that is solvent-free and free-flowing. It utilizes additive curing and consists of two components. This grade is specifically designed for textile coatings. ELASTOSIL® LR 6200 A/B has a very low viscosity, allowing for good penetration into the substrate and a dry surface touch. It is particularly well suited for textile coating applications that require enhanced flame retardancy.

SEMICOSIL® 6C2S is a hyperpure hexachlorodisilane with ultra-high purity and low metal content. This product falls under the category of silanes used for chemical vapor deposition (CVD) and spin-on dielectrics (SOD). It was specifically developed for the semiconductor industry, serving as a precursor for low-temperature deposition processes and other applications within the field.

SEMICOSIL® HMN-EL is a high-purity hexamethyldisilazane specifically developed for use in photoresists for semiconductor manufacturing. It serves as an adhesion promoter and silylating agent in processes like chemical amplification. This product is characterized by its high purity, low metal content, low chloride content, and low residue on evaporation, ensuring optimal performance in semiconductor applications.

SEMICOSIL® M3E is a high-purity methyltriethoxysilane (M3E) known for its excellent purity, low metal content, and low chloride content. This product has been specifically developed for the semiconductor industry, serving as a precursor for low dielectric constant interlayer dielectrics and other applications.

HDK® N20P is a hydrophilic, synthetic, amorphous silica produced through flame hydrolysis. It is a standard product widely used in various industrial applications. HDK® N20P is commonly applied in the electronics industry as a white colloidal powder of high purity.

SEMICOSIL® 4MS-EL is a high-purity silane compound specifically developed for the semiconductor industry. It is used as a precursor for low-dielectric-constant interlayer dielectrics in applications such as chemical vapor deposition (CVD) and spin-on dielectrics (SOD). This product is known for its high purity, low metal content, and low chloride content, ensuring optimal performance in semiconductor processes.