Products in Other Devices & Assemblies: Polysulfones

Polyarn bv PES - PolyEtherSulphone is known for its toughness and stability at high temperatures. Due to the high cost of raw materials and processing, polysulfones are used in specialty applications and often are a superior replacement for polycarbonates. Three polysulfones are used industrially: polysulfone (PSU), polyethersulfone (PES) and polyphenylene sulfone (PPSU). They can be used in the temperature range from -100 to +200°C and are used for electrical equipment, in vehicle construction and medical technology. Polysulfones have outstanding resistance to heat and oxidation, they are hydrolysis resistant and have good electrical properties.

OpteSTAT™ master batches are Ovation Polymers' line of nano-compounds based on carbon nanotubes. Our proprietary dispersion technology debundles and disentangles carbon nanotubes without compromising their integrity. OpteSTAT™ compounds exhibit good conductivity at minimal nanotube loadings, achieving exceptional cleanliness and physical property retention.OpteSTAT™ NC PES 6010 is Polyether Sulfone-based carbon nanotube compound. The material resistivity can be tailored to the application, while retaining the physical and thermal properties of the base polymer.Target applications include components of disk drives, business machines or other electronic assemblies where ESD control is required while retaining exceptional cleanliness, dimensional control and physical properties.

Self-lubricating product based on Polysulphone (PSU). Graphite. Mineral filler.

Polysulphone (PSU) based compound. Glass fibres. Low smoke density and low toxicity index. Very high dimensional stability.

Glass reinforced (20 %) Polyether Sulfone. Excellent chemical and electrical resistance, high stiffness, modulus and HDT.

Glass reinforced (30 %) Polyether Sulfone, excellent chemical and electrical resistance, high stiffness, modulus and HDT.

Polyether Sulfone Resin - Medium Viscosity, un-reinforced standard grade for easy injection molding.