Products in Architectural Coatings: Anti-Marring Agent

NexSil 8 is an alkaline dispersion of 8 nm colloidal silica at 30% SiO2 concentration in water. The particles are negatively charged and have a high specific surface area. The product can be used in a wide variety of applications such as precision investment casting, metal surface treatment, textile treatment, catalyst binder or other applications where a very small particle size colloidal silica is required.

NexSil 6 is an alkaline dispersion of 6 nm colloidal silica at a 16-18% SiO2 concentration in water. The particles are negatively charged and have a high surface area. NexSil 6 can be used in paper, steel, and precision polishing applications where a very small particle size colloidal silica is required.

Teraflow® 5301 imparts mar resistance and slip to coatings surfaces. It is used to protect coatings films from scratches and abrasion, while reducing orange peel and cratering.

NexSil 20 is an alkaline dispersion of 20 nm colloidal silica at 40% SiO2 concentration in water. The particles are negatively charged and have a high specific surface area. The product can be used in a wide variety of applications such as precision investment casting, precision polishing, metal surface treatment, textile treatment, catalyst binder or other applications where a small particle size colloidal silica is required.

Teraflow® 5300 is recommended for use in baking enamels, furniture coatings and catalyzed coatings systems, Tallicin® 5300 imparts slip and mar resistance, promotes gloss and surface flow, and reduces cratering and orange peel.

NexSil 12HS is an alkaline dispersion of 12 nm colloidal silica at 40% SiO2 concentration in water. The particles are negatively charged and have a high specific surface area. The product can be used in a wide variety of applications such as precision investment casting, metal surface treatment, textile treatment, catalyst binder or other applications where a very small particle size colloidal silica is required.

NexSil 85K-40 colloidal silica is a large-particle product primarily intended as an abrasive for formulated polishing slurries. NexSil 85K-40 is based on high-purity colloidal silica and contains very low levels of trace impurities, minimizing the introduction of impurities in the polishing process.

NexSil 20NH4 is an ammonia-stabilized alkaline dispersion of 20 nm colloidal silica at 40% SiO2 concentration in water. The particles are negatively charged and have a high specific surface area. NexSil 20NH4 can be used in a wide variety of applications such as precision investment casting, metal surface treatment, textile treatment, catalyst binder or other applications where a very small particle size colloidal silica is required.

NexSil 20A is an acidic dispersion of 20 nm colloidal silica at 30% concentration. The product is a clear liquid composed of highly uniform, spherical silica particles. The product has a slightly negative charge and is essentially free of Cl and sulfate ions.

ADDAPT WaxMul WM 35 is a high melting point PE-wax emulsion giving very good wet scrub resistance of Paints and improves the buffability of Floor polishes. It is an emulsion of Polyethylene wax in water.

Teraflow® 5330 is designed for nitrocellulose and acid-cured systems, Tallicin® 5330 improves flow, leveling and slip properties. It also improves scratch and mar resistance.

CERETAN® MP 2120 is a micronized Polypropylene wax.In paints and coatings: Application Paints and coatings, such as powder coatings, industrial paints, architectural, furniture and floor coatings Printing inks, such as gravure, overprint, screen printing and flexographic inks Masterbatch, especially for end-use applications with PP fibers and foils.CERETAN ® micronized waxes are predominantly produced using our highly advanced spraying technology leading to spherical particles. The spherical shape and the particles’ even surface help the dispersing process, reduce wax usage as well as dust formation. We guarantee D99 values to minimize oversized particles in your formulation.