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Headquartered in Fort Worth, Texas, with facilities in North America, Europe and Asia, KMG manufactures, formulates and globally distributes specialty chemicals for the Semiconductor, Industrial Wood Preservation, and Pipeline and Energy markets.

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Cleanroom

Cleanroom® LP Isopropanol 4% is used as a cleaning agent and disinfectant. It is used as a general cleaning agent for computer screens, laptops, other electronic devices and general fab manufacturing equipment found in cleanrooms. IPA can also remove minor oily residues from surfaces.

Cleanroom® LP Isopropanol 4%

Cleanroom® LP Ethylene Glycol 50% is a high purity process chemical for semiconductor rinse applications and in a high purity cooling system.

Cleanroom® LP Ethylene Glycol 50%

Cleanroom® LP MEK is a strong solvent that is typically used as a negative photoresist remover.

Cleanroom® LP MEK

KMG Chemicals 1,2-Ethylenediamine 40% is used in anistropic silicon etchants to preferentially etch one silicon lattice, namely &lt;100&gt; and &lt;110&gt; over &lt;111&gt; crystalline orientation.

KMG Chemicals 1,2-Ethylenediamine 40%

Cleanroom® LP Acetic Acid is used in mixed acid etchants and in SEZ etchants. Acetic acid is used in place of water to help keep nitric acid from dissociating, which makes for a more oxidizing solutions.

Cleanroom® LP Acetic Acid

Cleanroom® LP Acetone can be used for drying laboratory glassware, removing greasy or oily contaminants from work benches, or as a general photoresist stripper or edgebead remover.

Cleanroom® LP Acetone

KMG Chemicals Cyclohexanone is used as a solvent for photoresist, an edge bead remover, and a general solvent for organic polymers resists.

KMG Chemicals Cyclohexanone

Cleanroom® MB Hexamethyldisilazane (HMDS) is an adhesion promoter between photoresist and the silicon wafer.

Cleanroom® MB Hexamethyldisilazane (HMDS)

Cleanroom® MB Hydrochloric Acid 37% is a key ingredient to remove surface metallic ions by forming soluble metal chlorides. In semiconductor processing, the presence of metallic impurities on the wafer can lead to early dielectric breakdown.

Cleanroom® MB Hydrochloric Acid 37%

KMG Chemicals

Headquartered in Fort Worth, Texas, with facilities in North America, Europe and Asia, KMG manufactures, formulates and globally distributes specialty chemicals for the Semiconductor, Industrial Wood 

KMG Chemicals - Specialty Chemicals - Semiconductor - Pipeline

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Cleanroom® LP MEK Technical Data Sheet

Cleanroom® LP MEK Technical Data Sheet - KMG Chemicals

Cleanroom LP MEK - KMG Chemicals - Solvent - Knowde

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	Value	Units	Test Method / Conditions
Assay (C4H8O)	min. 99.5	%	-
Assay (H2O)	max. 0.1	%	-
Color	max. 10	APHA	-
Acidity	max. 0.6	μeq/g	-
Phosphate (PO4)	max. 1000	ppb	-
Residue After Evaporation	max. 20	ppm	-
Aluminum (Al)	max. 100	ppb	-
Antimony (Sb)	max. 10	ppb	-
Arsenic (As)	max. 10	ppb	-
Barium (Ba)	max. 500	ppb	-
Boron (B)	max. 200	ppb	-
Cadmium (Cd)	max. 500	ppb	-
Calcium (Ca)	max. 500	ppb	-
Chromium (Cr)	max. 100	ppb	-
Cobalt (Co)	max. 100	ppb	-
Copper (Cu)	max. 100	ppb	-
Gallium (Ga)	max. 500	ppb	-
Germanium (Ge)	max. 500	ppb	-
Gold (Au)	max. 100	ppb	-
Iron (Fe)	max. 100	ppb	-
Lead (Pb)	max. 500	ppb	-
Lithium (Li)	max. 500	ppb	-
Magnesium (Mg)	max. 500	ppb	-
Manganese (Mn)	max. 500	ppb	-
Nickel (Ni)	max. 100	ppb	-
Potassium (K)	max. 500	ppb	-
Silicon (Si)	max. 500	ppb	-
Silver (Ag)	max. 100	ppb	-
Sodium (Na)	max. 500	ppb	-
Strontium (Sr)	max. 500	ppb	-
Tin (Sn)	max. 500	ppb	-
Titanium (Ti)	max. 500	ppb	-
Zinc (Zn)	max. 500	ppb	-
Particle Count (1.0Micron )	max. 10	par/ml	-

Cleanroom® LP MEK

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