Products

KMG Chemicals Cyclohexanone is used as a solvent for photoresist, an edge bead remover, and a general solvent for organic polymers resists.

Cleanroom® LP MEK is a strong solvent that is typically used as a negative photoresist remover.

Cleanroom® LP Acetone can be used for drying laboratory glassware, removing greasy or oily contaminants from work benches, or as a general photoresist stripper or edgebead remover.

Cleanroom® MB Hexamethyldisilazane (HMDS) is an adhesion promoter between photoresist and the silicon wafer.

Cleanroom® LP Isopropanol 4% is used as a cleaning agent and disinfectant. It is used as a general cleaning agent for computer screens, laptops, other electronic devices and general fab manufacturing equipment found in cleanrooms. IPA can also remove minor oily residues from surfaces.