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NexSil™ 20NH4

1 of 22 products in this brand
NexSil™ 20NH4 is an ammonia-stabilized alkaline dispersion of 20 nm colloidal silica at 40% SiO2 concentration in water. The particles are negatively charged and have a high specific surface area. NexSil™ 20NH4 can be used in a wide variety of applications such as precision investment casting, metal surface treatment, textile treatment, catalyst binder or other applications where a very small particle size colloidal silica is required.

Chemical Family: Silica

Features: Excellent Scratch Resistance

Technical Data Sheet
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Identification & Functionality

Carrier
Chemical Family
CASE Ingredients Functions
Technologies

Features & Benefits

CASE Ingredients Features

Applications & Uses

Compatible Substrates & Surfaces

Properties

Physical Form
Appearance
Translucent Sol
Typical Properties
ValueUnitsTest Method / Conditions
Specific Gravity1.295--
SiO2 Content39 - 41%-
NH3 Content0.0 – 0.30%-
pH9.3--
Viscosity10 - 25cP-
Na Contentmax. 1000ppm-
Surface Area135m2/g-