- Chemical Family:Silica
- Features:Excellent Scratch Resistance
NexSil 20NH4 is an ammonia-stabilized alkaline dispersion of 20 nm colloidal silica at 40% SiO2 concentration in water. The particles are negatively charged and have a high specific surface area. NexSil 20NH4 can be used in a wide variety of applications such as precision investment casting, metal surface treatment, textile treatment, catalyst binder or other applications where a very small particle size colloidal silica is required.