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Daikin Industries, Ltd. HFC-23 (CHF3)

Daikin Industries, Ltd. HFC-23 (CHF3) is a high-purity gas designed for semiconductor manufacturing, boasting a purity level of 99.999 vol% (5N) or higher. It is specifically tailored for etching SiO₂ and low-k films, catering to the electrical and electronics sectors, particularly parts and component fabrication.

Functions: Etchant

Applicable Processes: Semiconductor Manufacturing

Features: High Purity

    Knowde Enhanced TDS

    Identification & Functionality

    Chemical Name
    Industrial Additives Functions
    CAS No.
    75-46-7
    EC No.
    200-872-4
    Chemical Formula

    CHF₃

    Features & Benefits

    Industrial Additives Features
    Product Highlights
    • Purity is 99.999vol% (5N) or more for semiconductor manufacturing.
    • Mainly suitable for etching SiO2 and low-k films.

    Applications & Uses

    Applicable Processes

    Properties

    Physical Form
    Physical Properties
    ValueUnitsTest Method / Conditions
    Boiling Point82°C
    Molecular Weight70.01
    Vapor Pressure (at 25°C)4.729MPa

    Technical Details & Test Data

    Inspection Items

    Purity (excluding air content), other fluorocarbons, acid content, moisture, air content

    Safety & Health

    Handling Method / Safety Information
    • Be sure to read the Safety Data Sheet (SDS) and precautions on the label before using.
    • This product has been developed for industrial purposes and we shall not guarantee the the safety if used for any other purposes. If it is going to be used for medical or food applications, please contact us in advice.

    Packaging & Availability

    Packing Specification

    10L container, 47L container, etc.