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Daikin Industries, Ltd. HFC-32 (CH2F2)

Daikin Industries, Ltd. HFC-32 (CH2F2) is a high-purity gas essential for semiconductor manufacturing, offering a purity of 99.99 vol% (4N) or higher. Specifically crafted for etching SiO₂, SiN, and low-k films, it serves the electrical and electronics sector, particularly in parts and component production.

Functions: Etchant

Applicable Processes: Semiconductor Manufacturing

Features: High Purity

    Knowde Enhanced TDS

    Identification & Functionality

    Chemical Name
    Industrial Additives Functions
    CAS No.
    75-10-5
    EC No.
    200-839-4
    Chemical Formula

    CH₂F₂

    Features & Benefits

    Labeling Claims
    Industrial Additives Features
    Product Highlights
    • Purity is 99.99vol% (4N) or more for semiconductor manufacturing.
    • Mainly suitable for etching SiO2, SiN and low-k films.

    Applications & Uses

    Applicable Processes

    Properties

    Physical Form
    Physical Properties
    ValueUnitsTest Method / Conditions
    Boiling Point-51.7°C
    Molecular Weight52.02
    Vapor Pressure (at 20°C)1.39MPa

    Technical Details & Test Data

    Inspection Items

    Purity (excluding air content), other fluorocarbons, acid content, moisture, air content.

    Safety & Health

    Handling Method / Safety Information
    • Be sure to read the Safety Data Sheet (SDS) and precautions on the label before using.
    • This product has been developed for industrial purposes and we shall not guarantee the the safety if used for any other purposes. If it is going to be used for medical or food applications, please contact us in advice.

    Packaging & Availability

    Packing Specification

    10L container, 47L container, etc.