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NexSil™ 125-40

1 of 22 products in this brand
NexSil™ 125-40 is an alkaline dispersion of 70 - 90 nm colloidal silica at a 40% SiO2 concentration in water. The particles are negatively charged. The product can be used in paper, steel and precision polishing applications where large particle size colloidal silica is required. NexSil 125-40 is a good choice as an abrasive for Si wafer stock-polish, sapphire wafer polishing and other hard substrate polishing. NexSil 125-40 is also excellent for paper antiskid and other antiblocking applications where the large particle colloidal silica is used. Consult NYACOL® for recommendations on starting conditions.

Chemical Family: Silica

Compatible Polymers & Resins: Other Compatible Resins

Features: Abrasion Resistance, Anti-Blocking, Anti-Slip, Excellent Scratch Resistance

End Uses: Paper & Pulp

Technical Data Sheet
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Identification & Functionality

Carrier
Chemical Family
Industrial Additives Functions

Features & Benefits

CASE Ingredients Features
Industrial Additives Features

Applications & Uses

Applicable Processes
Compatible Polymers & Resins
Industrial Additives End Use

Properties

Physical Form
Appearance
Milky White
Typical Properties
ValueUnitsTest Method / Conditions
SiO2 Content39 - 41%
Na2O Content0.05 – 0.3%
Particle Size (by TEM)70 - 90nm
Particle Size, DLS, Z-Average105 - 135nm
Specific Surface Area25 - 50m2/g
pH9 - 10
Viscosity3 - 15cPs
Surface ChargeNegative