Products

NexSil 85NH4 is an ammonia-stabilized alkaline dispersion of 85 nm colloidal silica at 40% SiO2 concentration in water with low alkali metal levels. The particles are negatively charged. NexSil 85NH4 can be used in a wide variety of applications such as paper, steel and precision polishing applications where large particle size colloidal silica is required.

NexSil™ 85-40 is an alkaline dispersion of 40 - 60 nm colloidal silica at a 40% SiO2 concentration in water. The particles are negatively charged. The product can be used in paper, steel and precision polishing applications where large particle size colloidal silica is required. NexSil 85-40 is a good choice for sapphire polishing and other specialty wafer polishing applications. NexSil 85-40 provides good balance between removal rate and surface finish. Consult NYACOL® for recommendations on starting conditions.

NexSil™ 125-40 is an alkaline dispersion of 70 - 90 nm colloidal silica at a 40% SiO2 concentration in water. The particles are negatively charged. The product can be used in paper, steel and precision polishing applications where large particle size colloidal silica is required. NexSil 125-40 is a good choice as an abrasive for Si wafer stock-polish, sapphire wafer polishing and other hard substrate polishing. NexSil 125-40 is also excellent for paper antiskid and other antiblocking applications where the large particle colloidal silica is used. Consult NYACOL® for recommendations on starting conditions.

NYACOL® AL25 have been developed utilizing new innovative technology for colloidal alumina. AL25 is a colloidal dispersions of boehmite with dispersed sizes of 70-80 nm at 20% Al2O3 content. Typically AL25 will have up to 500 ppm Na content.

NexSil 6 is an alkaline dispersion of 6 nm colloidal silica at a 16-18% SiO2 concentration in water. The particles are negatively charged and have a high surface area. NexSil 6 can be used in paper, steel, and precision polishing applications where a very small particle size colloidal silica is required.