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NexSil™ 85-40

1 of 22 products in this brand
NexSil™ 85-40 is an alkaline dispersion of 40 - 60 nm colloidal silica at a 40% SiO2 concentration in water. The particles are negatively charged. The product can be used in paper, steel and precision polishing applications where large particle size colloidal silica is required. NexSil 85-40 is a good choice for sapphire polishing and other specialty wafer polishing applications. NexSil 85-40 provides good balance between removal rate and surface finish. Consult NYACOL® for recommendations on starting conditions.

Chemical Family: Silica

Features: Excellent Scratch Resistance

Technical Data Sheet
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CASE Ingredients Features

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Compatible Substrates & Surfaces

Properties

Physical Form
Appearance
Light Milky Sol
Typical Properties
ValueUnitsTest Method / Conditions
SiO2 Content39 - 41%
Na2O Content0.05 – 0.2%
Particle Size (by TEM)40 – 60nm
Particle Size, DLS, Z-Average70 - 90nm
Specific Surface Area45 - 75m2/g
pH8.8 – 9.8
Viscositymax. 20cPs
Surface ChargeNegative