Brands

Perfluoroelastomer (FFKM) is the most chemically resistant elastomer available and is effectively a rubber form of PTFE. Perlast® perfluoroelastomer grades provide other properties which prove most valuable in critical sealing applications where purity, high temperatures and retention of sealing force are paramount. The Perlast® range of perfluoroelastomer materials are at the leading edge of polymer technology. They have been developed to offer superior sealing solutions with enhanced performance and improved functionality, which is proven in the field (see case studies).

A unique range of fully organic elastomers ideally suited to thermal, dynamic and specific plasma processes where radical concentrations are generally lower or where inorganic filler systems are undesirable. The Kimura® range of high performance elastomer materials utilize a controlled molecular architecture which provides a unique self-reinforcing polymer structure, providing improved chemical resistance without the use of inorganic fillers of any kind. This high purity material breaks new ground in elastomer technology, developed specifically for aggressive chlorine and CxFy based semiconductor applications. Kimura® elastomers span the range of fluoro and perfluoro (FKM and FFKM) materials and includes unique hybrid elastomers, specifically developed by PPE, for the semiconductor industry, to offer a step-change in sealing performance, surpassing what has previously been achievable for fully organic materials. The high purity of the polymer combined with the absence of inorganic fillers makes Kimura® materials suitable for processes involving lower feature sizes.

Nanofluor® elastomers can be considered as hybrid materials, bridging a gap between the low cost of fluoroelastomer (FKM) and high cost of perfluoroelastomer (FFKM) polymer types. The range includes a fully organic ultra-low outgassing material and an inorganic filled grade with unique nano-filler to reduce erosion rates. The nano-filled material provides a chemical inertness only seen in much more costly FFKM grades and been developed for plasma ash or resist strip, chlorine and CxFy based etch processes. Nanofluor® grades provide some of the lowest trace metal contamination levels available from elastomer seals and ultra-low permeation rates.