NexSil 20K-30 is a potassium-stabilized alkaline dispersion of 20nm colloidal silica at 30% SiO2 concentration in water. The particles are negatively charged and have a high specific surface area. NexSil 20K-30 can be used in a wide variety of applications such as precision investment casting, precision polishing, metal surface treatment, textile treatment, catalyst binder, or other applications where a small particle-size colloidal silica is required.