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SEMICOSIL® 2M2M

SEMICOSIL® 2M2M is a high-purity dimethoxydimethylsilane with low levels of metal, chloride, and methanol content. It was developed specifically for the semiconductor industry, serving as a precursor for low-dielectric-constant interlayer dielectrics. This product is commonly used in chemical vapor deposition (CVD) and spin-on dielectric (SOD) applications.

Brand: SEMICOSIL (27 products)

Functions: Precursor

Chemical Family: Silanes

Applicable Processes: Semiconductor Manufacturing

Features: Low Chloride Content

Synonyms: Dimethyldimethoxysilane, DMDMOS, NSC 93882

Technical Data Sheet

Enhanced TDS

Knowde-enriched technical product data sheet

Identification & Functionality

Chemical Family
Chemical Name
Industrial Additives Functions
CAS No.
1112-39-6
Molecular formula
C₄H₁₂O₂Si
EC No.
214-189-4
Technologies
Product Families

Features & Benefits

Applications & Uses

Markets
Applications
Applicable Processes
Application Details

SEMICOSIL® 2M2M was developed for the semiconductor industry, e.g. as precursor for low dielectric constant interlayer dielectrics.

Properties

Physical Form
Appearance
Colorless clear liquid
Typical Properties
ValueUnitsTest Method / Conditions
Molecular Weight120g/mol-
Assay99%Gas Chromatography
Boiling Point (at 1013 hPa)78°C-
Density (at 25°C)0.86g/cm³DIN 51757
Melting Pointmax. -30 °C-
Molecular Weight (Mw)120g/mol-
Properties
  • High purity
  • Low metal content
  • Low chloride content
  • Low methanol content

Regulatory & Compliance

Packaging & Availability

Country Availability
Regional Availability
  • Africa
  • Asia
  • Europe
  • Latin America
  • North America
  • Oceania