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SEMICOSIL® 6C2S

1 of 27 products in this brand
SEMICOSIL® 6C2S is a hyperpure hexachlorodisilane with ultra-high purity and low metal content. This product falls under the category of silanes used for chemical vapor deposition (CVD) and spin-on dielectrics (SOD). It was specifically developed for the semiconductor industry, serving as a precursor for low-temperature deposition processes and other applications within the field.

Functions: Precursor

Chemical Family: Silanes

Applicable Processes: Semiconductor Manufacturing

Technical Data Sheet

Knowde Enhanced TDS

Identification & Functionality

Chemical Family
Industrial Additives Functions
Molecular formula
Cl₆Si₂
EC No.
236-704-1
CAS No.
13465-77-5

Features & Benefits

Applications & Uses

Applicable Processes
Application Details

SEMICOSIL 6C2S was developed for the semiconductor industry, e.g. as precursor for low temperature deposition processes.

Properties

Physical Form
Appearance
Colorless clear liquid
Soluble in
Organic solvents 
Typical Properties
ValueUnitsTest Method / Conditions
Boiling Point145°C
Molecular Weight269
Density (at 25°C)1.56g/cm³
Hexachlorodisilanemin. 99.5%
Hexachlorodisiloxanemax. 0.05%
Melting Point-1°C
Metallic Impurities Individualmax. 15.0 ppb
Metallic Impurities Totalmax. 100.0 ppb
Tetrachlorosilanemax. 0.2%
Properties
  • Ultra high purity
  • Low metal content

Regulatory & Compliance

Packaging & Availability

Country Availability
Regional Availability
  • Africa
  • Asia
  • Europe
  • Latin America
  • North America
  • Oceania